The technology is called SF2, and it will be the company's initial 2nm-class fabrication process. The node is projected to offer significant improvements when it comes to performance and efficiency. Based on the company's own description, the upcoming node will further refine Samsung's multi-bridge channel field-effect transistor architecture. This will enable it to increase transistor performance by 11–46 percent and reduce variability compared to an unspecified FinFET-based process technology by 26%, while